Controlled strained layer epitaxial growth of EuTiO3 on buffered silicon
نویسندگان
چکیده
In this work, we show the epitaxial growth of (111)-oriented EuTiO3 thin films on (001)-oriented silicon with an in situ grown yttria-stabilized zirconia (YSZ) buffer layer by pulsed laser deposition. X-ray diffraction measurements revealed a homogeneously strained film strain dependency fluence during growth. From magnetization vs temperature measurements, confirmed that have antiferromagnetic to ferromagnetic transition at 3.7 K, which disappeared for unstrained films. Furthermore, used electron backscatter analyze columnar YSZ, showed four in-plane orientations.
منابع مشابه
New mechanism for dislocation blocking in strained layer epitaxial growth
Dislocation interactions play a critical role in plasticity and heteroepitaxial strain relaxation. We use real time transmission electron microscopy observations of the interaction between threading and misfit dislocations in SiGe heterostructures to investigate interactions quantitatively. In addition to the expected long-range blocking of threading segments, we observe a new short-range mecha...
متن کاملShape transitions of epitaxial islands during strained layer growth: anatase TiO2(001) on SrTiO3(001).
Extended annealing in UHV causes the surface region of SrTiO3(001) to become enriched with TiO2, resulting in the formation of epitaxial islands of anatase TiO2(001). The islands are studied using UHV scanning electron microscopy (SEM), which reveals the changes in morphology during growth induced by misfit strain. Starting from a square island, two types of shape transition are observed. In th...
متن کاملWafer Bonding and Strained-Layer Silicon
s of the Invited Presentations Vienna University of Technology April 10 and 11, 2003 Society for Microelectronics Vienna, 2003 Society for Microelectronics c/o Institute of Industrial Electronics and Material Science Vienna University of Technology Gusshausstraße 27–29/366 A-1040 Vienna, Austria
متن کاملEpitaxial diamond-hexagonal silicon nano-ribbon growth on (001) silicon
Silicon crystallizes in the diamond-cubic phase and shows only a weak emission at 1.1 eV. Diamond-hexagonal silicon however has an indirect bandgap at 1.5 eV and has therefore potential for application in opto-electronic devices. Here we discuss a method based on advanced silicon device processing to form diamond-hexagonal silicon nano-ribbons. With an appropriate temperature anneal applied to ...
متن کاملEpitaxial silicon oxynitride layer on a 6H-SiC(0001) surface.
Hydrogen-gas etching of a 6H-SiC(0001) surface and subsequent annealing in nitrogen atmosphere leads to the formation of a silicon oxynitride (SiON) epitaxial layer. A quantitative low-energy electron diffraction analysis revealed that the SiON layer has a hetero-double-layer structure: a silicate monolayer on a silicon nitride monolayer via Si-O-Si bridge bonds. There are no dangling bonds in ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2022
ISSN: ['1089-7550', '0021-8979', '1520-8850']
DOI: https://doi.org/10.1063/5.0092582